Revision as of 05:24, 24 February 2011 editCheMoBot (talk | contribs)Bots141,565 edits Updating {{chembox}} (no changed fields - added verified revid - updated 'UNII_Ref', 'ChemSpiderID_Ref', 'StdInChI_Ref', 'StdInChIKey_Ref', 'ChEMBL_Ref', 'KEGG_Ref') per Chem/Drugbox validation (← Previous edit | Latest revision as of 13:23, 25 August 2022 edit undoFswitzer4 (talk | contribs)Extended confirmed users10,998 editsm Added UNII | ||
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{{chembox | {{chembox | ||
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| ImageFileL1 = Oxalyl fluoride.svg | | ImageFileL1 = Oxalyl fluoride.svg | ||
| ImageSizeL1 = 110px | | ImageSizeL1 = 110px | ||
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| ImageSizeR1 = 120px | | ImageSizeR1 = 120px | ||
| ImageNameR1 = Ball-and-stick model of oxalyl fluoride | | ImageNameR1 = Ball-and-stick model of oxalyl fluoride | ||
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| PIN = Oxalyl difluoride | ||
| OtherNames = |
| OtherNames = TL-108 | ||
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|Section1={{Chembox Identifiers | ||
| CASNo_Ref = {{cascite|correct|??}} | |||
| CASNo = 359-40-0 | |||
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| CASNo = 359-40-0 | ||
| UNII_Ref = {{fdacite|correct|FDA}} | |||
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| UNII = 2L7RR7QFL9 | |||
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| PubChem = 9668 | |||
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⚫ | | EINECS = 206-630-4 | ||
⚫ | | SMILES = C(=O)(C(=O)F)F | ||
⚫ | | InChI = 1/C2F2O2/c3-1(5)2(4)6 | ||
| ChemSpiderID_Ref = {{chemspidercite|changed|chemspider}} | |||
| ChemSpiderID = 9287 | |||
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|Section2={{Chembox Properties | ||
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| Formula = C<sub>2</sub>F<sub>2</sub>O<sub>2</sub> | ||
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| MolarMass = 94.017 g/mol | ||
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| MeltingPtC = -3 | ||
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| BoilingPtC = 26.6 | ||
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⚫ | |Section3={{Chembox Hazards | ||
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'''Oxalyl fluoride''' is the ] with the formula (COF)<sub>2</sub>. It is a ] derivative of ]. This colorless liquid is prepared by reaction of ] with ].<ref>{{cite journal|doi=10.1021/jo01081a050|title=Synthesis of Fluorides by Metathesis with Sodium Fluoride|author=C. W. Tullock, D. D. Coffman|journal=J. Org. Chem.|year=1960|volume=25|issue=11|page=2016–2019}}</ref> | |||
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⚫ | Oxalyl fluoride is being investigated for use in etching as a replacement for compounds which have the liability of high ].<ref>, US Patent 6635185.</ref><ref>{{cite journal|title=Evaluation of Oxalyl Fluoride for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool|journal=J. Electrochem. Soc.|volume= 148|issue= 3|pages= G141–G149|year=2001|author1=Simon Karecki |author2=Ritwik Chatterjee |author3=Laura Pruette |author4=Rafael Reif |author5=Terry Sparks |author6=Laurie Beu |author7=Victor Vartanian |author8=Konstantin Novoselovc |name-list-style=amp |doi=10.1149/1.1348263|bibcode=2001JElS..148G.141K}}</ref> | ||
==See also== | ==See also== | ||
* ] | * ] | ||
* ] | |||
* ] | |||
* ] | |||
==References== | ==References== | ||
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{{Organohalide-stub}} | {{Organohalide-stub}} |
Latest revision as of 13:23, 25 August 2022
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Names | |||
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Preferred IUPAC name Oxalyl difluoride | |||
Other names TL-108 | |||
Identifiers | |||
CAS Number | |||
3D model (JSmol) | |||
ChemSpider | |||
ECHA InfoCard | 100.006.029 | ||
EC Number |
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PubChem CID | |||
UNII | |||
CompTox Dashboard (EPA) | |||
InChI
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SMILES
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Properties | |||
Chemical formula | C2F2O2 | ||
Molar mass | 94.017 g/mol | ||
Melting point | −3 °C (27 °F; 270 K) | ||
Boiling point | 26.6 °C (79.9 °F; 299.8 K) | ||
Except where otherwise noted, data are given for materials in their standard state (at 25 °C , 100 kPa). N verify (what is ?) Infobox references |
Oxalyl fluoride is the organofluorine compound with the formula (COF)2. It is a fluorinated derivative of oxalic acid. This colorless liquid is prepared by reaction of sodium fluoride with oxalyl chloride.
Oxalyl fluoride is being investigated for use in etching as a replacement for compounds which have the liability of high global warming potential.
See also
References
- C. W. Tullock, D. D. Coffman (1960). "Synthesis of Fluorides by Metathesis with Sodium Fluoride". J. Org. Chem. 25 (11): 2016–2019. doi:10.1021/jo01081a050.
- Method of etching and cleaning using fluorinated carbonyl compounds, US Patent 6635185.
- Simon Karecki; Ritwik Chatterjee; Laura Pruette; Rafael Reif; Terry Sparks; Laurie Beu; Victor Vartanian & Konstantin Novoselovc (2001). "Evaluation of Oxalyl Fluoride for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool". J. Electrochem. Soc. 148 (3): G141 – G149. Bibcode:2001JElS..148G.141K. doi:10.1149/1.1348263.
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